Buch, Englisch, 372 Seiten, Format (B × H): 152 mm x 229 mm, Gewicht: 697 g
Buch, Englisch, 372 Seiten, Format (B × H): 152 mm x 229 mm, Gewicht: 697 g
ISBN: 978-0-08-100086-1
Verlag: Elsevier Science & Technology
Protected Metal Clusters: From Fundamentals to Applications surveys the fundamental concepts and potential applications of atomically precise metal clusters protected by organic ligands.
As this class of materials is now emerging as a result of breakthroughs in synthesis and characterization that have taken place over the last few years, the book provides the first reference with a focus on these exciting novel nanomaterials, explaining their formation, and how, and why, they play an important role in the future of molecular electronics, catalysis, sensing, biological imaging, and medical diagnosis and therapy.
Fachgebiete
- Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Materialwissenschaft: Metallische Werkstoffe
- Technische Wissenschaften Technik Allgemein Nanotechnologie
- Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Materialwissenschaft: Biomaterialien, Nanomaterialien, Kohlenstoff
Weitere Infos & Material
1. Introduction, Tatsuya Tsukuda and Hannu Häkkinen 2. Controlled Synthesis: Size Control, Shinjiro Takano and Tatsuya Tsukuda 3. Controlled Synthesis: Composition and Interface Control, Yuichi Negishi 4. Structural Engineering of Heterometallic Nanoclusters, Yu Wang, Huayan Yang and Nanfeng Zheng 5. Structure Determination by Single-Crystal X-Ray Crystallography, Christopher Ackerson 6. Atomic-scale Structure Analysis by Advanced Transmission Electron Microscopy, Richard Palmer and Zhiwei Wang 7. Structure Prediction by Density Functional Theory Calculations, Qing Tang and De-en Jiang 8. Electronic Structure: Development of the Superatom Concept, Hannu Häkkinen 9. Optical Properties and Chirality, Christine Aikens 10. Catalytic Properties, Yuxiang Chen and Rongchao Jin 11. Functionalization and Application, Nirmal Goswami, Jingguo Li and Jianping Xie
