Buch, Englisch, 1176 Seiten, Format (B × H): 252 mm x 176 mm, Gewicht: 1916 g
Buch, Englisch, 1176 Seiten, Format (B × H): 252 mm x 176 mm, Gewicht: 1916 g
ISBN: 978-0-08-044699-8
Verlag: Elsevier Science & Technology
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.
Zielgruppe
Graduate students interested in entering electronics materials industry and other thin film device technology areas. Students in materials and electronic engineering. Professionals in the materials science industry.
Autoren/Hrsg.
Fachgebiete
- Technische Wissenschaften Verfahrenstechnik | Chemieingenieurwesen | Biotechnologie Metallurgie
- Technische Wissenschaften Sonstige Technologien | Angewandte Technik Bergbau, Hüttenwesen
- Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Materialwissenschaft: Metallische Werkstoffe