Molecular Beam Epitaxy

Fundamentals and Current Status
2. Auflage 1996. Softcover Nachdruck of the original 2. Auflage 1996
ISBN: 978-3-642-80062-7
Verlag: Springer

Buch, Englisch, Band 7, 453 Seiten, Format (B × H): 155 mm x 235 mm, Gewicht: 715 g

Reihe: Springer Series in Materials Science

Molecular Beam Epitaxy describes a technique in wide-spread use for the production of high-quality semiconductor devices. It discusses the most important aspects of the MBE apparatus, the physics and chemistry of the crystallization of various materials and device structures, and the characterization methods that relate the structural parameters of the grown (or growing) film or structure to the technologically relevant procedure. In this second edition two new fields have been added: crystallization of as-grown low-dimensional heterostructures, mainly quantum wires and quantum dots, and in-growth control of the MBE crystallization process of strained-layer structures. Out-of-date material has been removed.

Zielgruppe

Research

Autoren/Hrsg.

Sitter, Helmut

Herman, Marian A.

Fachgebiete

• Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Materialwissenschaft: Elektronik, Optik
• Naturwissenschaften Chemie Anorganische Chemie
• Technische Wissenschaften Elektronik | Nachrichtentechnik Elektronik

Inhaltsverzeichnis

Background Information.- 1. Introduction.- Technological Equipment.- 2. Sources of Atomic and Molecular Beams.- 3. High-Vacuum Growth and Processing Systems.- Characterization Methods.- 4. Characterization Techniques.- MBE Growth Process.- 5. MBE Growth Processes of Lattice-Matched Structures.- 6. Growth Processes in Strained-Layer MBE.- 7. Material-Related Growth Characteristics in MBE.- Conclusion.- 8. Outlook.- References.