E-Book, Englisch, Band 10, 374 Seiten, eBook
Ryssel / Glawischnig Ion Implantation Techniques
Erscheinungsjahr 2012
ISBN: 978-3-642-68779-2
Verlag: Springer
Format: PDF
Kopierschutz: 1 - PDF Watermark
Lectures given at the Ion Implantation School in Connection with Fourth International Conference on Ion Implantation: Equipment and Techniques Berchtesgaden, Fed. Rep. of Germany, September 13–15, 1982
E-Book, Englisch, Band 10, 374 Seiten, eBook
Reihe: Springer Series in Electronics and Photonics
ISBN: 978-3-642-68779-2
Verlag: Springer
Format: PDF
Kopierschutz: 1 - PDF Watermark
Zielgruppe
Research
Autoren/Hrsg.
Weitere Infos & Material
I Machine Aspects of Ion Implantation.- Ion Implantation System Concepts.- Ion Sources.- Faraday Cup Designs for Ion Implantation.- Safety and Ion Implanters.- II Ion Ranges in Solids.- The Stopping and Range of Ions in Solids.- The Calculation of Ion Ranges in Solids with Analytic Solutions.- Range Distributions.- III Measuring Techniques and Annealing.- Electrical Measuring Techniques.- Wafer Mapping Techniques for Characterization of Ion Implantation Processing.- Non-Electrical Measuring Techniques.- Annealing and Residual Damage.- IV Appendix: Modern Ion Implantation Equipment TM.- Evolution and Performance of the Nova NV-10 Predep™ Implanter.- Ion Implantation Equipment from Veeco.- The Series III A and IIIX Ion Implanters.- Standard High-Voltage Power Supplies for Ion Implantation.- The IONMICROPROBE A-DIDA 3000-30 for Dopant Depth Profiling and Impurity Bulk Analysis.- List of Contributors.