Nakamura Photopolymers

Photoresist Materials, Processes, and Applications
Erscheinungsjahr 2014
ISBN: 978-1-4665-1731-8
Verlag: Taylor & Francis
Format: PDF
Kopierschutz: Adobe DRM (»Systemvoraussetzungen)

E-Book, Englisch, 189 Seiten

Reihe: Optics and Photonics

Advancements in photopolymers have led to groundbreaking achievements in the electronics, print, optical engineering, and medical fields. At present, photopolymers have myriad applications in semiconductor device manufacturing, printed circuit boards (PCBs), ultraviolet (UV) curing, printing plates, 3-D printing, microelectromechanical systems (MEMS), and medical materials. Processes such as photopolymerization, photodegradation, and photocrosslinking, as well as lithography technology in which photofabrications are performed by images of photopolymers, have given rise to very large-scale integrated (VLSI) circuits, microproducts, and more.

Addressing topics such as chemically amplified resists, immersion lithography, extreme ultraviolet (EUV) lithography, and nanoimprinting, Photopolymers: Photoresist Materials, Processes, and Applications covers photopolymers from core concepts to industrial applications, providing the chemical formulae and structures of the materials discussed as well as practical case studies from some of the world’s largest corporations. Offering a state-of-the-art review of progress in the development of photopolymers, this book provides valuable insight into current and future opportunities for photopolymer use.

Zielgruppe

Scientists and engineers involved in the electronics, print, optical, and medical fields.

Autoren/Hrsg.

Nakamura, Kenichiro

Fachgebiete

• Technische Wissenschaften Technik Allgemein Technische Optik, Lasertechnologie
• Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde
• Technische Wissenschaften Verfahrenstechnik | Chemieingenieurwesen | Biotechnologie Verfahrenstechnik, Chemieingenieurwesen
• Technische Wissenschaften Sonstige Technologien | Angewandte Technik Lasertechnologie, Holographie

Inhaltsverzeichnis

Introduction

About the Author

Basic Idea of Photopolymerization

Introduction

Radical Polymerization

Monomers for Photopolymerization

Initiators of Photopolymerization

Inhibition of Polymerization

Cationic Photopolymerization

Photocrosslinking

Scission of Polymers

References

Chemically Amplified Resists

Introduction

Chemical Amplification of Photopolymers

Polymers for Chemical Amplification

Photoacid Generator

References

Process of Chemically Amplified Resists

Introduction

Progress of Resolution Limit

Immersion Lithography

Double Patterning

EUV Lithography

Direct Self-Assembly (DSA)

References

Nanoimprinting

Introduction

Thermal Nanoimprinting

UV Nanoimprinting

Cationic Polymerization of UV Nanoimprinting

Ene-Thiol Polymerization of UV Nanoimprinting

Soft Lithography

References

Industrial Applications of Photopolymers

Introduction

Application to Electronics

Optical Adhesive Polymers

Holographic Photopolymers

Application to Medical Materials

Microelectromechanical Systems (MEMS)

References

Über Autor(innen)

Kenichiro Nakamura graduated from Kanazawa University, Japan in 1963 and from the University of Tokyo, Japan in 1968 with his doctorate in engineering. He conducted his postdoctoral fellowship at the University of Texas at Austin, USA in 1968–1970. His experience also includes working for Prof. Albert Noyes in photochemistry; holding the positions of associate professor (1970–1978), professor (1978–2010), and honorary professor (2010–present) at Tokai University, Japan; and serving as editor-in-chief of the Journal of Photopolymer Science and Technology (1998–present). In addition to books, his work has been published in many prestigious journals.