Diffusion Mechanisms in Crystalline Materials: Volume 527

Erscheinungsjahr 1998
ISBN: 978-1-55899-433-1
Verlag: Cambridge University Press

Buch, Englisch, 568 Seiten, Format (B × H): 157 mm x 234 mm, Gewicht: 930 g

Reihe: MRS Proceedings

Solid-state diffusion often controls the evolution of the structure and properties of engineering materials, during both processing and the working lifetime of the engineered product. Diffusion characteristics of crystalline materials are critical for the manufacturing and operation of an enormous range of advanced products, from microelectronic devices to gas turbine blades. Many fundamental diffusion data issues remain unresolved. This book focuses on experimental and simulation techniques that provide access to atomic-scale mechanisms of diffusion in different classes of crystalline materials. Recent advances in the understanding of microscopic mechanisms of diffusion are reviewed and future research directions are discussed. More importantly, the book features an exchange of ideas among the communities of diffusion scientists working with metals and metallic alloys, intermetallic compounds, semiconductors, ceramics and ionic materials. Topics include: diffusion mechanisms in metals and alloys; diffusion in intermetallic compounds; grain boundary and surface diffusion - diffusion in quasicrystals; diffusion in semiconductors; and diffusion in ionic conductivity and ionic materials.

Autoren/Hrsg.

Mishin, Yuri

Vogl, Gero

Cowern, Nicholas

Catlow, Richard

Farkas, Diana