Sonstiges, Englisch, 90 Seiten, Format (B × H): 125 mm x 142 mm, Gewicht: 200 g
Sonstiges, Englisch, 90 Seiten, Format (B × H): 125 mm x 142 mm, Gewicht: 200 g
ISBN: 978-3-03859-882-4
Verlag: Trans Tech Publications
Volume is indexed by Thomson Reuters CPCI-S (WoS).
These proceedings describe the most recent advances and trends in the fields of dusty and colloidal plasmas: a new discipline which is highly relevant to those working on nanostructured materials, nanotechnologies and devices which are processed using plasma and fusion tools. For instance, in the case of thin-film devices, the production of new materials such as polymorphous or quasi-morphous silicon or even silicon nanotubes is highly dependent upon the production of particles, in the plasma, which are suitable for incorporation into the films produced. Therefore, it is very important to know how dusty and colloidal plasmas behave, and how high-grade electronic films can be processed under such conditions.
Autoren/Hrsg.
Fachgebiete
Weitere Infos & Material
Processing of Thin Film Silicon Solar Cells under Ionic Bombardment ControlInfluence of the Plasma Regime on the Structural, Optical, Electrical and Morphological Properties of a-Si:H Thin FilmsSilicon Films Produced by PECVD under Powder Formation ConditionsMicrogravity Experiments in the MIR Space StationLaser-Excited Mach Cones in Plasma CrystalsLaser Excitation of Oscillations and Waves in Dust Crystals: a TutorialCharging Kinetics of Dust Particles with a Variable MassInfluence of Dust Particles on Sheaths in an Oblique Magnetic FieldRadio Frequency Discharge with Dust Particles
