Ma / Arce Computational Lithography

1. Auflage 2010
ISBN: 978-0-470-61893-6
Verlag: John Wiley & Sons
Format: PDF
Kopierschutz: Adobe DRM (»Systemvoraussetzungen)

E-Book, Englisch, Band 1, 256 Seiten, E-Book

Reihe: Wiley Series in Pure and Applied Optics

A Unified Summary of the Models and Optimization Methods Used inComputational Lithography
Optical lithography is one of the most challenging areas ofcurrent integrated circuit manufacturing technology. Thesemiconductor industry is relying more on resolution enhancementtechniques (RETs), since their implementation does not requiresignificant changes in fabrication infrastructure. ComputationalLithography is the first book to address the computationaloptimization of RETs in optical lithography, providing an in-depthdiscussion of optimal optical proximity correction (OPC), phaseshifting mask (PSM), and off-axis illumination (OAI) RET tools thatuse model-based mathematical optimization approaches.
The book starts with an introduction to optical lithographysystems, electric magnetic field principles, and the fundamentalsof optimization from a mathematical point of view. It goes on todescribe in detail different types of optimization algorithms toimplement RETs. Most of the algorithms developed are based on theapplication of the OPC, PSM, and OAI approaches and theircombinations. Algorithms for coherent illumination as well aspartially coherent illumination systems are described, and numeroussimulations are offered to illustrate the effectiveness of thealgorithms. In addition, mathematical derivations of alloptimization frameworks are presented.
The accompanying MATLAB® software files for all the RETmethods described in the book make it easy for readers to run andinvestigate the codes in order to understand and apply theoptimization algorithms, as well as to design a set of optimallithography masks. The codes may also be used by readers for theirresearch and development activities in their academic or industrialorganizations. An accompanying MATLAB® software guide is alsoincluded. An accompanying MATLAB® software guide is included,and readers can download the software to use with the guide atftp://ftp.wiley.com/public/sci_tech_med/computational_lithography.
Tailored for both entry-level and experienced readers,Computational Lithography is meant for faculty, graduatestudents, and researchers, as well as scientists and engineers inindustrial organizations whose research or career field issemiconductor IC fabrication, optical lithography, and RETs.Computational lithography draws from the rich theory of inverseproblems, optics, optimization, and computational imaging; as such,the book is also directed to researchers and practitioners in thesefields.

Autoren/Hrsg.

Ma, Xu

Arce, Gonzalo R.

Inhaltsverzeichnis

Preface.
Acknowledgments.
Acronyms.
1 Introduction.
1.1 Optical Lithography.
1.2 Rayleigh's Resolution.
1.3 Resist Processes and Characteristics.
1.4 Techniques in Computational Lithography.
1.5 Outline.
2 Optical Lithography Systems.
2.1 Partially Coherent Imaging Systems.
2.2 Approximation Models.
2.3 Summary.
3 Rule-Based Resolution Enhancement Techniques.
3.1 RET Types.
3.2 Rule-Based OPC.
3.3 Rule-Based PSM.
3.4 Rule-Based OAI.
3.5 Summary.
4 Fundamentals of Optimization.
4.1 Definition and Classification.
4.2 Unconstrained Optimization.
4.3 Summary.
5 Computational Lithography with CoherentIllumination.
5.1 Problem Formulation.
5.2 OPC Optimization.
5.3 Two-Phase PSM Optimization.
5.4 Generalized PSM Optimization.
5.5 Resist Modeling Effects.
5.6 Summary.
6 Regularization Framework.
6.1 Discretization Penalty.
6.2 Complexity Penalty.
6.3 Summary.
7 Computational Lithography with Partially CoherentIllumination.
7.1 OPC Optimization.
7.2 PSM Optimization.
7.3 Summary.
8 Other RET Optimization Techniques.
8.1 Double-Patterning Method.
8.2 Post-Processing Based on 2D DCT.
8.3 Photoresist Tone Reversing Method.
8.4 Summary.
9 Source and Mask Optimization.
9.1 Lithography Preliminaries.
9.2 Topological Constraint.
9.3 Source-Mask Optimization Algorithm.
9.4 Simulations.
9.5 Summary.
10 Coherent Thick-Mask Optimization.
10.1 Kirchhoff Boundary Conditions.
10.2 Boundary Layer Model.
10.3 Lithography Preliminaries.
10.4 OPC Optimization.
10.5 PSM Optimization.
10.6 Summary.
11 Conclusions and New Directions of ComputationalLithography.
11.1 Conclusion.
11.2 New Directions of Computational Lithography.
Appendix A: Formula Derivation in Chapter 5.
Appendix B: Manhattan Geometry.
Appendix C: Formula Derivation in Chapter 6.
Appendix D: Formula Derivation in Chapter 7.
Appendix E: Formula Derivation in Chapter 8.
Appendix F: Formula Derivation in Chapter 9.
Appendix G: Formula Derivation in Chapter 10.
Appendix H: Software Guide.
References.
Index.

Über Autor(innen)

Dr. Xu Ma received a PhD in electrical and computerengineering from the University of Delaware. He is now with theElectrical Engineering and Computer Science Department at theUniversity of California at Berkeley. Dr. Ma's research interestsinclude computational imaging, signal processing, and computationallithography.
Dr. Gonzalo R. Arce received a PhD degree in electricalengineering from Purdue University. He is the Charles Black EvansDistinguished Professor of Electrical and Computer Engineering atthe University of Delaware and holds the Fulbright-NokiaDistinguished Chair in Information and Communications Technologies.Dr. Arce's fields of interest include nonlinear and statisticalsignal processing, digital printing, and computational imaging. Heis a Fellow of the IEEE for his contributions to the theory andapplications of nonlinear signal processing.