E-Book, Englisch, Band 171, 282 Seiten, eBook
E-Book, Englisch, Band 171, 282 Seiten, eBook
Reihe: Nanostructure Science and Technology
ISBN: 978-1-4614-9176-7
Verlag: Springer US
Format: PDF
Kopierschutz: 1 - PDF Watermark
Zielgruppe
Professional/practitioner
Autoren/Hrsg.
Weitere Infos & Material
Copper Electrodeposition.- Suppression Effect and Additive Chemistry.- Acceleration Effect.- Modeling and Simulation.- Frontiers of Cu Electrodeposition and Electroless Plating for On-Chip Interconnects.- Microstructure of Evolution of Copper in Nano-scale Interconnect Features.- Direct Copper Plating.- Through Silicon Via.- Build-up Printed Wiring Boards.- Copper Foil Smooth on Both Sides for Lithium Ion Battery.- Through Hole Plating.