Buch, Englisch, 295 Seiten, Format (B × H): 148 mm x 210 mm
Reihe: Solare Energie- und Systemforschung / Solar Energy and Systems Research
Buch, Englisch, 295 Seiten, Format (B × H): 148 mm x 210 mm
Reihe: Solare Energie- und Systemforschung / Solar Energy and Systems Research
ISBN: 978-3-8396-2100-4
Verlag: Fraunhofer Verlag
Through-mask electrochemical machining is a non-conventional metal patterning technique which allows very high etching rates using non-hazardous electrolytes. Consequently, it represents a promising alternative to chemical etching processes in a variety of applications, particularly in the context of printed circuit board (PCB) production. Nevertheless, the process is currently lacking a comprehensive understanding of the underlying reaction mechanisms.
This thesis examines the dissolution process at the microscopic and mechanistic levels by in-situ analysis and polarization studies conducted under a range of varying parameters, electrolytes, and metals. The first in-situ evidence for the so far only postulated surface film is found. A model for the dissolution mechanism at high current densities involving the surface film is postulated. Additionally, significant advances in process development are achieved.
This thesis examines the dissolution process at the microscopic and mechanistic levels by in-situ analysis and polarization studies conducted under a range of varying parameters, electrolytes, and metals. The first in-situ evidence for the so far only postulated surface film is found. A model for the dissolution mechanism at high current densities involving the surface film is postulated. Additionally, significant advances in process development are achieved.
Jakob / Fraunhofer ISE
Through-mask Electrochemical Machining for Conductor Track Manufacturing - Fundamental Insights and Practical Implications jetzt bestellen!
Autoren/Hrsg.
Fachgebiete
Bitte ändern Sie das Passwort
