Howe / Lamb / Wandelt Surface Science

Principles and Applications
1993
ISBN: 978-3-642-84933-6
Verlag: Springer
Format: PDF
Kopierschutz: 1 - PDF Watermark

E-Book, Englisch, Band 73, 301 Seiten, eBook

Reihe: Springer Proceedings in Physics

Surface science has existed as a recognized discipline for more than 20 years. During this period, the subject has expanded in two important ways. On the one hand, the techniques available for studying surfaces, both experimental and theoretical, have grown in number and in sophistication. On the other hand, surface science has been applied to an increasing number of areas of technology, such as catalysis, semicon ductor processing, new materials development, corrosion prevention, adhesion and tribology. . There is, however, no sharp division between fundamental and applied surface science. New techniques can immediately be applied to technologically important problems. Improvements in understanding of fundamental phenomena such as epi taxial growth of one metal on another, or the bonding of hydrocarbons to metal sur faces, to name just two examples, have direct consequences for technology. Surface science has also become very much an interdisciplinary subject; physics, chemistry, materials science, chemical and electronical engineering all draw upon and contribute to surface science. The intimate relationship between principles and applications of surface science forms the theme of this proceedings volume. The contributions were all presented as invited lectures at an Australian-German Workshop on Surface Science held at Coogee Beach, Sydney, Australia, in December 1991. The contributors, all active surface scientists in their respective countries, were asked to highlight recent develop ments in their own areas of activity involving new techniques, advances in funda mental understanding or new applications in technology.

Zielgruppe

Research

Autoren/Hrsg.

Howe, Russel F.

Lamb, Robert N.

Wandelt, Klaus

Inhaltsverzeichnis

I Surface Science Techniques.- Scanning Tunneling Microscopy on Clean and Adsorbate-Covered Semiconductor and Metal Surfaces.- Photoelectron Holography: A Status Report.- Studies of Surface Composition and Structure Using Low-Energy Ion Scattering and SIMS.- Heavy-Ion Rutherford Backscattering Spectrometry.- Auger Photoelectron Coincidence Spectroscopy of Transition Metals.- Second-Harmonic Generation Applied to the Formation of Ultrathin Organic Films on Inorganic Substrates.- II Metal Surfaces.- Restructuring at Surfaces.- The Role of Kinetic Effects in the Growth of Pt on Pt(111).- Vibrational Spectroscopy of Alloy Surfaces and Adsorbate-Covered Metal Surfaces.- Surface Barrier States and Resonances of Metals.- III Semiconductor Surfaces.- Cleavage Processes and Steps in Semiconductors.- The Alkali Metal Induced Oxidation of Si(100) Surfaces.- Similarities Between Crystalline Silicon Surfaces and Amorphous Silicon Films.- The Clean and Hydrogen-Terminated (100) and (111) Surfaces of Diamond and Silicon.- IV Thin Films.- Formation of Zinc Oxide Thin Films by the Thermal Decomposition of Zinc Acetate.- Surface Analysis of Pigments and Stressed Polymer Films Using X-Ray Photoelectron Spectroscopy.- V Catalysts.- Model Catalysts: The Local Properties of Specific Surface Sites.- Adsorption and Reaction of Small Molecules on Oxide Surfaces.- Surface Science in Three Dimensions: Zeolites as Model Catalysts.- On the Role of Aromaticity in Bonding Hydrocarbons to Metal Surfaces.- Investigation of Catalyst Systems by Means of Low-Energy Ion Scattering.- Surface Analysis of Catalysts by Electron Spectroscopy and Ion Scattering Spectroscopy.- Supported Copper Catalysts: Surface Studies and Catalytic Performance.- Index of Contributors.