Buch, Englisch, 264 Seiten, Format (B × H): 168 mm x 240 mm, Gewicht: 524 g
Processing and Integration of Microelectronic Devices
Buch, Englisch, 264 Seiten, Format (B × H): 168 mm x 240 mm, Gewicht: 524 g
ISBN: 978-3-658-41040-7
Verlag: Springer
The book presents the basic steps and the technical implementation of individual processes for microelectronic circuit integration in silicon. Interaction and influences of e. g. oxidation, etching, doping and thermal processes for integrating CMOS- and Bipolar circuits are discussed in detail, beginning with the purification of silicon up to the encapsulated integrated circuit. It includes modern processes like atomic layer deposition and etching for nanoscale structures and compares improvements like silicide contacts, copper metallization, high-k dielectrics, and SOI and FINFET structures. All processes are presented looking from the process engineer’s view.
Zielgruppe
Upper undergraduate
Autoren/Hrsg.
Fachgebiete
Weitere Infos & Material
Wafer fabrication.- Thermal oxidation.- Lithography.- Etching technology.- Doping techniques.- Chemical and Physical Deposition.- Metallization and Contacts.