Buch, Englisch, 232 Seiten, Format (B × H): 152 mm x 229 mm, Gewicht: 450 g
Buch, Englisch, 232 Seiten, Format (B × H): 152 mm x 229 mm, Gewicht: 450 g
ISBN: 978-0-323-98865-0
Verlag: William Andrew Publishing
Coulomb Interactions in Particle Beams, Volume 223 in the Advances in Imaging and Electron Physics series, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and computing methods used in all these domains, with this release exploring Coulomb Interactions in Particle Beams.
Zielgruppe
<p>Physicists, electrical engineers and applied mathematicians in all branches of image processing and microscopy as well as electron physics in general</p>
Autoren/Hrsg.
Fachgebiete
- Technische Wissenschaften Sonstige Technologien | Angewandte Technik Signalverarbeitung, Bildverarbeitung, Scanning
- Naturwissenschaften Physik Elektromagnetismus Mikroskopie, Spektroskopie
- Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Materialwissenschaft: Elektronik, Optik
- Technische Wissenschaften Technik Allgemein Technische Optik, Lasertechnologie
- Mathematik | Informatik EDV | Informatik Informatik Bildsignalverarbeitung
- Technische Wissenschaften Energietechnik | Elektrotechnik Elektrotechnik
Weitere Infos & Material
1. Introduction Peter Hawkes 2. Definitions, notation, and methods of analysis Peter Hawkes 3. Quadrupole potential functions Peter Hawkes 4. Quadrupole systems: Their suitability for specific tasks Peter Hawkes 5. Quadrupole data Peter Hawkes