Buch, Englisch, 266 Seiten, Format (B × H): 152 mm x 229 mm, Gewicht: 526 g
Buch, Englisch, 266 Seiten, Format (B × H): 152 mm x 229 mm, Gewicht: 526 g
ISBN: 978-0-323-98863-6
Verlag: Elsevier Inc
Advances in Imaging and Electron Physics, Volume 224 highlights new advances in the field, with this new volume presenting interesting chapters on Measuring elastic deformation and orientation gradients by scanning electron microscopy - conventional, new and emerging methods, Development of an alternative global method with high angular resolution, Implementing the new global method, Numerical validation of the method and influence of optical distortions, and Applications of the method.
Zielgruppe
<p>Academic, government and industrial sectors</p>
Autoren/Hrsg.
Weitere Infos & Material
Preface Martin Hÿtch and Peter W. Hawkes 1. Measuring elastic strains and orientation gradients by scanning electron microscopy: Conventional and emerging methods Clément Ernould, Benoît Beausir, Jean-Jacques Fundenberger, Vincent Taupin and Emmanuel Bouzy 2. Development of a global homography-based approach for high-angular resolution in the SEM Clément Ernould, Benoît Beausir, Jean-Jacques Fundenberger, Vincent Taupin and Emmanuel Bouzy 3. Implementing the homography-based global approach Clément Ernould, Benoît Beausir, Jean-Jacques Fundenberger, Vincent Taupin and Emmanuel Bouzy 4. Numerical validation and influence of optical distorsions on accuracy Clément Ernould, Benoît Beausir, Jean-Jacques Fundenberger, Vincent Taupin and Emmanuel Bouzy 5. Applications of the method Clément Ernould, Benoît Beausir, Jean-Jacques Fundenberger,Vincent Taupin and Emmanuel Bouzy 6. Spin wave physics: The nonlinear spin wave-electromagnetic interaction and implications for high frequency devices Clifford M. Krowne