Fortunelli / Netzer | Oxide Materials at the Two-Dimensional Limit | Buch | 978-3-319-80327-2 | sack.de

Buch, Englisch, Band 234, 389 Seiten, Previously published in hardcover, Format (B × H): 155 mm x 235 mm, Gewicht: 6146 g

Reihe: Springer Series in Materials Science

Fortunelli / Netzer

Oxide Materials at the Two-Dimensional Limit

Buch, Englisch, Band 234, 389 Seiten, Previously published in hardcover, Format (B × H): 155 mm x 235 mm, Gewicht: 6146 g

Reihe: Springer Series in Materials Science

ISBN: 978-3-319-80327-2
Verlag: Springer International Publishing


This book summarizes the current knowledge of two-dimensional oxide materials. The fundamental properties of 2-D oxide systems are explored in terms of atomic structure, electronic behavior and surface chemistry. The concept of polarity in determining the stability of 2-D oxide layers is examined, charge transfer effects in ultrathin oxide films are reviewed as well as the role of defects in 2-D oxide films. The novel structure concepts that apply in oxide systems of low dimensionality are addressed, and a chapter giving an overview of state-of-the-art theoretical methods for electronic structure determination of nanostructured oxides is included. Special emphasis is given to a balanced view from the experimental and the theoretical side. Two-dimensional materials, and 2-D oxides in particular, have outstanding behavior due to dimensionality and proximity effects. Several chapters treat prototypical model systems as illustrative examples to discuss the peculiar physical and chemical properties of 2-D oxide systems. The chapters are written by renowned experts in the field.
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Ultrathin oxide films on Au(111) substrates.- Surface chemistry on oxide nanostructures.- Electronic structure methods for nanostructured interfaces.- 2-D titania systems.- Properties of reducible oxides as ultrathin films.- 2-D ceria systems.- Structure concepts in 2-D oxide materials.- Polarity in 2-D oxides.- Doping aspects in 2-D oxides.- Charge transfer effects in ultrathin oxide films.- Phonons in 2-D oxide systems.- Defects at interfaces of Si and 2-D oxide films.- Ultrathin films of ternary oxides.- 2-D oxide interfaces.


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