Buch, Englisch, 356 Seiten, Format (B × H): 170 mm x 240 mm, Gewicht: 800 g
ISBN: 978-3-908451-79-2
Verlag: Trans Tech Publications
This eleventh volume in the series covering the latest results in the field includes abstracts of papers which have appeared since the publication of Annual Retrospective X (Volumes 280-281). As well as the 589 ceramics abstracts, the issue includes original papers on all of the major material groups, and theory: “Positron Annihilation in Ion-Implanted ZnO” (A.D.Acharya, G.Singh and S.B.Shrivastava), “Optical Characteristics of Tungsten Oxide Thin Films Prepared by Sputtering Technique” (S.A.Aly), “Research on Magnetization Mechanism of Nano-Magnetic Fluid” (J.Li and D.Li), “Clustering of Arsenic Atoms in Silicon during Low-Temperature Annealing” (O.Velichko and O.Burunova), “Effect of Current Density on Composition and Microstructure of Si Diffusion Layer by Electrodeposition” (H.Yang, Y.Zhang, Y.Li, G.Tang and K.Jia), “Positron Annihilation & Micro-Hardness Measurement of 6063 and 6066 with Compromise with Ingot Al” (M.A.Abdel-Rahman, A.Al-deen and E.A.Badawi), “Stress-Induced Migration and Trapping of Hydrogen in AISI403 Steel” (G.P.Tiwari, V.D.Alur and E.Ramadasan), “Electromigration Force on a Proton with a Bound State” (A.Lodder).
Autoren/Hrsg.
Fachgebiete
- Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Materialwissenschaft: Keramik, Glas, Sonstige Werkstoffe
- Technische Wissenschaften Verfahrenstechnik | Chemieingenieurwesen | Biotechnologie Metallurgie
- Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Materialwissenschaft: Metallische Werkstoffe
- Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Festigkeitslehre, Belastbarkeit
Weitere Infos & Material
Positron Annihilation in Ion-Implanted ZnO
Optical Characteristics of Tungsten Oxide Thin Films Prepared by Sputtering Technique
Research on Magnetization Mechanism of Nano-Magnetic Fluid
Clustering of Arsenic Atoms in Silicon during Low-Temperature Annealing
Effect of Current Density on Composition and Microstructure of Si Diffusion Layer by Electrodeposition
Positron Annihilation & Micro-Hardness Measurement of 6063 and 6066 with Compromise with Ingot Al
Stress-Induced Migration and Trapping of Hydrogen in AISI403 Steel
Electromigration Force on a Proton with a Bound State
