Feldman Nanolithography

The Art of Fabricating Nanoelectronic and Nanophotonic Devices and Systems
1. Auflage 2014
ISBN: 978-0-85709-875-7
Verlag: Elsevier Science & Techn.
Format: EPUB
Kopierschutz: Adobe DRM (»Systemvoraussetzungen)

E-Book, Englisch, 592 Seiten

Reihe: Woodhead Publishing Series in Electronic and Optical Materials

Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful. The rate of shrinking is astonishing - some components are now just a few dozen atoms wide. This book attempts to answer the questions, 'What comes next? and 'How do we get there?Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the resists used in lithography, the masks (or lack thereof), the metrology needed for nano-features, modeling, and the limitations caused by feature edge roughness. In addition emerging technologies are described, including the directed assembly of wafer features, nanostructures and devices, nano-photonics, and nano-fluidics.This book is intended as a guide to the researcher new to this field, reading related journals or facing the complexities of a technical conference. Its goal is to give enough background information to enable such a researcher to understand, and appreciate, new developments in nanolithography, and to go on to make advances of his/her own. - Outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions - Covers lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography - Describes the emerging applications of nanolithography in nanoelectronics, nanophotonics and microfluidics

Autoren/Hrsg.

Feldman, M.

Inhaltsverzeichnis

1;Cover ;1
2;Nanolithography: The art of fabricating nanoelectronic and nanophotonic devices and systems ;4
3;Copyright ;5
4;Contents;6
5;Contributor contact details;14
6;Woodhead Publishing Series in Electronic and Optical Materials;18
7;Preface;24
8;1: Optical projection lithography;26
8.1;1.1 Introduction;26
8.2;1.2 Lithography technology and trends;26
8.3;1.3 Fundamentals of optical lithography;30
8.4;1.4 Image evaluation;33
8.5;1.5 Projection lithography systems;38
8.6;1.6 Wavelengths for optical lithography;47
8.7;1.7 Lithography in the deep ultraviolet (UV);48
8.8;1.8 Resolution enhancement technology;52
8.9;1.9 Immersion lithography;61
8.10;1.10 Multiple patterning optical lithography;63
8.11;1.11 Conclusion;65
8.12;1.12 References;65
9;2: Extreme ultraviolet (EUV) lithography;67
9.1;2.1 Introduction;67
9.2;2.2 EUV sources;77
9.3;2.3 EUV optics;83
9.4;2.4 EUV masks;87
9.5;2.5 EUV resists;95
9.6;2.6 EUV integration and implementation challenges;98
9.7;2.7 Conclusion and future trends;100
9.8;2.8 Acknowledgments;101
9.9;2.9 References;102
10;3: Electron beam lithography;105
10.1;3.1 Introduction;105
10.2;3.2 Using pixel parallelism to address the throughput bottleneck;109
10.3;3.3 The tradeoff between resolution and throughput;121
10.4;3.4 Distributed systems;125
10.5;3.5 Ultimate lithographic resolution;129
10.6;3.6 Electron-beam patterning of photomasks for optical lithography;132
10.7;3.7 Conclusion;135
10.8;3.8 Acknowledgements;136
10.9;3.9 References;136
11;4: Focused ion beams for nano-machining and imaging;141
11.1;4.1 Introduction;141
11.2;4.2 An adumbrated history of focused ion beams (FIBs);143
11.3;4.3 Sources of ions: a quartet of types;144
11.4;4.4 Charged particle optics;150
11.5;4.5 Ion-matter interactions;153
11.6;4.6 Milling;163
11.7;4.7 Deposition;170
11.8;4.8 Imaging;172
11.9;4.9 Spectroscopy;178
11.10;4.10 Conclusion and future trends;178
11.11;4.11 References;180
12;5: Masks for microand nanolithography;183
12.1;5.1 Introduction;183
12.2;5.2 Mask materials;187
12.3;5.3 Mask process;192
12.4;5.4 Mask metrology;193
12.5;5.5 Defects and masks;197
12.6;5.6 Conclusion;202
12.7;5.7 References;203
13;6: Maskless photolithography;204
13.1;6.1 Introduction;204
13.2;6.2 The use of photons as opposed to charged particles;205
13.3;6.3 Forms of maskless photolithography;206
13.4;6.4 Zone-plate-array lithography (ZPAL);208
13.5;6.5 Proximity-effect correction;211
13.6;6.6 Extending the resolution of ZPAL;212
13.7;6.7 Commercialization of ZPAL by LumArray, Inc.;214
13.8;6.8 Conclusion;216
13.9;6.9 References;217
14;7: Chemistry and processing of resists for nanolithography;219
14.1;7.1 Introduction;219
14.2;7.2 Resists for optical lithography: synthesis and radiation induced chemistry of resists as a function of exposure technology;225
14.3;7.3 Chemically amplified resist process considerations;240
14.4;7.4 Chemically amplified resists for 193 nm lithography;242
14.5;7.5 Resists for extreme ultraviolet lithography (EUVL);256
14.6;7.6 Resists for electron beam lithography;259
14.7;7.7 Resists for selected forward looking lithographic technologies;290
14.8;7.8 Resist resolution limitations;293
14.9;7.9 Conclusion;295
14.10;7.10 References;296
15;8: Directed assembly nanolithography;312
15.1;8.1 Introduction;312
15.2;8.2 Block copolymers in lithography;312
15.3;8.3 Directed self-assembly of block copolymers;319
15.4;8.4 Programmable three-dimensional lithography;327
15.5;8.5 Conclusion;335
15.6;8.6 References;336
16;9: Nanoimprint lithography;340
16.1;9.1 Introduction;340
16.2;9.2 An overview of imprint lithography;345
16.3;9.3 Soft lithography;346
16.4;9.4 Thermal imprint lithography;347
16.5;9.5 Alternative thermal imprint processes;352
16.6;9.6 Ultraviolet (UV) nanoimprint lithography overview;355
16.7;9.7 Jet and flash imprint lithography;356
16.8;9.8 Roll to roll imprint lithography;365
16.9;9.9 Defectivity;367
16.10;9.10 Conclusions;369
16.11;9.11 Acknowledgments;370
16.12;9.12 References;370
17;10: Nanostructures: fabrication and applications;373
17.1;10.1 Introduction;373
17.2;10.2 Characterization of nanostructures;375
17.3;10.3 Methods to create nanostructures: top-down fabrication of nanostructures;375
17.4;10.4 Methods to create nanostructures: bottom-up fabrication of nanostructures;383
17.5;10.5 Properties of nanostructures;389
17.6;10.6 Applications of nanostructures;395
17.7;10.7 References;396
18;11: Nanophotonics: devices for manipulating light at the nanoscale;401
18.1;11.1 Introduction;401
18.2;11.2 Photonic crystals;402
18.3;11.3 Ring resonators;404
18.4;11.4 Extraordinary optical transmission through subwavelength apertures;407
18.5;11.5 Optical nanoantennas;409
18.6;11.6 Plasmonic focusing;412
18.7;11.7 Near-field optical microscopy;415
18.8;11.8 Plasmonic waveguides;417
18.9;11.9 Enhancement of nonlinear processes;418
18.10;11.10 Application in photovoltaics;420
18.11;11.11 Conclusion;420
18.12;11.12 References;421
19;12: Nanodevices: fabrication, prospects for low dimensional devices and applications;424
19.1;12.1 Introduction;424
19.2;12.2 Motivation for nanodevices;426
19.3;12.3 Nanofabrication: creating the building blocks for devices;428
19.4;12.4 Prospects for low dimensional devices;433
19.5;12.5 Beyond the bottom-up: hybrid nanoelectronics;438
19.6;12.6 Conclusion and future trends;442
19.7;12.7 References;442
20;13: Microfluidics: technologies and applications;449
20.1;13.1 Introduction;449
20.2;13.2 Current trends in microfluidics;450
20.3;13.3 Present state of technology;454
20.4;13.4 Applications;459
20.5;13.5 Future trends;461
20.6;13.6 Conclusion;465
20.7;13.7 Sources of further information and advice;465
20.8;13.8 References;466
21;14: Modeling of nanolithography processes;469
21.1;14.1 Introduction;469
21.2;14.2 Optical lithography modeling;470
21.3;14.3 The optical system in optical lithography modeling;474
21.4;14.4 Photoresist model;478
21.5;14.5 Model critical dimension (CD) extraction;479
21.6;14.6 Difficulties in modeling;480
21.7;14.7 Extreme ultraviolet (EUV)/electron beam lithography modeling;482
21.8;14.8 Conclusion;487
21.9;14.9 References;487
22;15: Mask-substrate alignment via interferometric moir é fringes;491
22.1;15.1 Introduction;491
22.2;15.2 Background to alignment methods;492
22.3;15.3 Fundamentals of interferometricspatial phase imaging (ISPI);497
22.4;15.4 Implementation of moiré;500
22.5;15.5 Characteristics of moir é fringe formation;504
22.6;15.6 Performance of ISPI;519
22.7;15.7 Backside ISPI;522
22.8;15.8 Conclusion and future trends;525
22.9;15.9 References;526
23;16: Sidewall roughness in nanolithography: origins, metrology and device effects;528
23.1;16.1 Introduction;528
23.2;16.2 Metrology and characterization;530
23.3;16.3 Process and material effects: modeling and simulation;538
23.4;16.4 Process and material effects: experimental results;540
23.5;16.5 Impact on device performance;548
23.6;16.6 Conclusions;555
23.7;16.7 References;557
24;17: New applications and emerging technologies in nanolithography;563
24.1;17.1 Introduction;563
24.2;17.2 Applications of high-resolution patterning to new device structures: advances in tunneling structures;566
24.3;17.3 Geometry control of the tunnel junctions;568
24.4;17.4 The quantum dot placement problem;572
24.5;17.5 Conclusion;573
24.6;17.6 Acknowledgments;574
24.7;17.7 References;574
25;Index;576

Leseproben

Woodhead Publishing Series in Electronic and Optical Materials
1 Circuit analysis
J. E. Whitehouse 2 Signal processing in electronic communications: For engineers and mathematicians
M. J. Chapman, D. P. Goodall and N. C. Steele 3 Pattern recognition and image processing
D. Luo 4 Digital filters and signal processing in electronic engineering: Theory, applications, architecture, code
S. M. Bozic and R. J. Chance 5 Cable engineering for local area networks
B. J. Elliott 6 Designing a structured cabling system to ISO 11801: Cross-referenced to European CENELEC and American Standards
Second edition
B. J. Elliott 7 Microscopy techniques for materials science
A. Clarke and C. Eberhardt 8 Materials for energy conversion devices
Edited by C. C. Sorrell, J. Nowotny and S. Sugihara 9 Digital image processing: Mathematical and computational methods
Second edition
J. M. Blackledge 10 Nanolithography and patterning techniques in microelectronics
Edited by D. Bucknall 11 Digital signal processing: Mathematical and computational methods, software development and applications
Second edition
J. M. Blackledge 12 Handbook of advanced dielectric, piezoelectric and ferroelectric materials: Synthesis, properties and applications
Edited by Z.-G. Ye 13 Materials for fuel cells
Edited by M. Gasik 14 Solid-state hydrogen storage: Materials and chemistry
Edited by G. Walker 15 Laser cooling of solids
S. V. Petrushkin and V. V. Samartsev 16 Polymer electrolytes: Fundamentals and applications
Edited by C. A. C. Sequeira and D. A. F. Santos 17 Advanced piezoelectric materials: Science and technology
Edited by K. Uchino 18 Optical switches: Materials and design
Edited by S. J. Chua and B. Li 19 Advanced adhesives in electronics: Materials, properties and applications
Edited by M. O. Alam and C. Bailey 20 Thin film growth: Physics, materials science and applications
Edited by Z. Cao 21 Electromigration in thin films and electronic devices: Materials and reliability
Edited by C.-U. Kim 22 In situ characterization of thin film growth
Edited by G. Koster and G. Rijnders 23 Silicon-germanium (SiGe) nanostructures: Production, properties and applications in electronics
Edited by Y. Shiraki and N. Usami 24 High-temperature superconductors
Edited by X. G. Qiu 25 Introduction to the physics of nanoelectronics
S. G. Tan and M. B. A. Jalil 26 Printed films: Materials science and applications in sensors, electronics and photonics
Edited by M. Prudenziati and J. Hormadaly 27 Laser growth and processing of photonic devices
Edited by N. A. Vainos 28 Quantum optics with semiconductor nanostructures
Edited by F. Jahnke 29 Ultrasonic transducers: Materials and design for sensors, actuators and medical applications
Edited by K. Nakamura 30 Waste electrical and electronic equipment (WEEE) handbook
Edited by V. Goodship and A. Stevels 31 Applications of ATILA FEM software to smart materials: Case studies in designing devices
Edited by K. Uchino and J.-C. Debus 32 MEMS for automotive and aerospace applications
Edited by M. Kraft and N. M. White 33 Semiconductor lasers: Fundamentals and applications
Edited by A. Baranov and E. Tournie 34 Handbook of terahertz technology for imaging, sensing and communications
Edited by D. Saeedkia 35 Handbook of solid-state lasers: Materials, systems and applications
Edited by B. Denker and E. Shklovsky 36 Organic light-emitting diodes (OLEDs): Materials, devices and applications
Edited by A. Buckley 37 Lasers for medical applications: Diagnostics, therapy and surgery
Edited by H. Jelínková 38 Semiconductor gas sensors
Edited by R. Jaaniso and O. K. Tan 39 Handbook of organic materials for optical and optoelectronic devices: Properties and applications
Edited by O. Ostroverkhova 40 Metallic films for electronic, optical and magnetic applications: Structure, processing and properties
Edited by K. Barmak and K. Coffey 41 Handbook of laser welding technologies
Edited by S. Katayama 42 Nanolithography: The art of fabricating nanoelectronic and nanophotonic devices and systems
Edited by M. Feldman 43 Laser spectroscopy for sensing: Fundamentals, techniques and applications
Edited by M. Baudelet 44 Chalcogenide glasses: Preparation, properties and applications
Edited by J.-L. Adam and X. Zhang 45 Handbook of MEMS for wireless and mobile applications
Edited by D. Uttamchandani 46 Subsea optics and imaging
Edited by J. Watson and O. Zielinski 47 Carbon nanotubes and graphene for photonic applications
Edited by S. Yamashita, Y. Saito and J. H. Choi 48 Optical biomimetics: Materials and applications
Edited by M. Large 49 Optical thin films and coatings
Edited by A. Piegari and F. Flory 50 Computer design of diffractive optics
Edited by V. A. Soifer 51 Smart sensors and MEMS: Intelligent devices and microsystems for industrial applications
Edited by S. Nihtianov and A. L. Estepa 52 Fundamentals of femtosecond optics
S. A. Kozlov and V. V. Samartsev 53 Nanostructured semiconductor oxides for the next generation of electronics and functional devices: Production, properties and applications
S. Zhuiykov 54 Nitride semiconductor light-emitting diodes (LEDs): Materials, technologies and applications
Edited by J. J. Huang, H. C. Kuo and S. C. Shen 55 Sensor technologies for civil infrastructures Volume 1: Sensing hardware and data collection for performance assessment
Edited by M. Wang, J. Lynch and H. Sohn 56 Sensor...