Buch, Englisch, 450 Seiten, Format (B × H): 152 mm x 229 mm, Gewicht: 771 g
Buch, Englisch, 450 Seiten, Format (B × H): 152 mm x 229 mm, Gewicht: 771 g
ISBN: 978-981-4364-02-7
Verlag: Pan Stanford
Zielgruppe
Academic and Postgraduate
Autoren/Hrsg.
Fachgebiete
Weitere Infos & Material
General Introduction. Part 1: Integration of Multigate Devices (FinFET). Introduction to Multigate Devices and Integration Challenges. Patterning Requirements for Multigate Devices. Gate Stack Design. Source/Drain Design: Reduction of Parasitic Resistance.
Part 2: Circuit-Related Aspects. Variability and Its Implications for FinFET SRAM.
High T Performance of FinFET. ESD and Multigate Devices. Part 3: Beyond FinFET.
The Junctionless Nanowire Transistor. Transport in Nanostructures. Transport Spectroscopy of a Single Dopant in a Gated Silicon Nanowire. Thermionic Theory as a Tool for the Study of Transport in Doped and Undoped Si n-FINFETs Scaled Up to the Full Body Inversion Limit.