New Perspectives on Surface Passivation: Understanding the Si-Al2O3 Interface

Softcover Nachdruck of the original 1. Auflage 2016
ISBN: 978-3-319-81307-3
Verlag: Springer International Publishing

Buch, Englisch, 204 Seiten, Paperback, Format (B × H): 155 mm x 235 mm, Gewicht: 3577 g

Reihe: Springer Theses

The book addresses the problem of
passivation at the surface of crystalline silicon solar cells. More
specifically, it reports on a high-throughput, industrially compatible
deposition method for Al2O3, enabling its application to commercial solar cells.
One of the main focus is on the analysis of the physics of Al2O3 as a
passivating dielectric for silicon surfaces. This is accomplished through a comprehensive
study, which moves from the particular, the case of aluminium oxide on silicon,
to the general, the physics of surface recombination, and is able to connect
theory with practice, highlighting relevant commercial applications.

Zielgruppe

Research

Autoren/Hrsg.

Black, Lachlan E.

Fachgebiete

• Technische Wissenschaften Elektronik | Nachrichtentechnik Elektronik Halb- und Supraleitertechnologie
• Technische Wissenschaften Verfahrenstechnik | Chemieingenieurwesen | Biotechnologie Technologie der Oberflächenbeschichtung
• Technische Wissenschaften Energietechnik | Elektrotechnik Solarenergie, Photovoltaik
• Technische Wissenschaften Energietechnik | Elektrotechnik Elektrotechnik

Inhaltsverzeichnis

Introduction.- Surface Recombination Theory.- Al2O3 Deposition and Characterisation.- Electrical Properties of the Si.Al2O3 Interface.- Influence of Deposition Parameters.-Effect of Post-Deposition Thermal Processing- Effect of Surface Dopant Concentration.- Effect of Surface Orientation and Morphology.- Relationship Between Al2O3 Bulk and Interface Properties.- Conclusion.