Basting / Marowsky Excimer Laser Technology

1. Auflage 2005
ISBN: 978-3-540-26667-9
Verlag: Springer Berlin Heidelberg
Format: PDF
Kopierschutz: 1 - PDF Watermark

E-Book, Englisch, 433 Seiten

A timely and comprehensive survey, Excimer Laser Technology reports on the current status and range of the underlying technology, applications and devices of this commonly used laser source, as well as the future of new technologies, such as F2 laser technology.

Autoren/Hrsg.

Basting, Dirk

Marowsky, Gerd

Inhaltsverzeichnis

1;Preface;5
2;Contents;7
3;List of Contributors;14
4;1 Introduction;19
4.1;1.1 Introductory Remarks;19
4.2;1.2 Historical Review of Excimer Laser Development;26
4.3;1.3 Trends in Worldwide Excimer Laser Sales;40
5;Fundamentals;48
5.1;2 Some Fundamentals of Laser Physics;49
5.1.1;2.1 The Wave-Particle Duality of Light;49
5.1.2;2.2 Electromagnetic Radiation;49
5.1.3;2.3 Spontaneous and Stimulated Emission, Population Inversion;50
5.1.4;2.4 Design Principle of a Laser;53
5.1.5;2.5 Types of Lasers;54
5.1.6;References;56
5.2;3 Principles of Excimer Lasers;57
5.2.1;References;61
5.3;4 Design and Technology of Excimer Lasers;62
5.3.1;4.1 Excitation;62
5.3.2;4.2 Preionization;64
5.3.3;4.3 Discharge Electrodes;66
5.3.4;4.4 Discharge Circuits;67
5.3.5;4.5 Power Supplies;73
5.3.6;4.6 Circulation, Laser Gas Cooling, and Cleaning;77
5.3.7;4.7 Safety Standards for Industrial Excimer Lasers;79
5.3.8;References;88
5.4;5 Specially Designed Excimer Lasers;89
5.4.1;5.1 High-Repetition-Rate and High-Power Lasers;89
5.4.1.1;References;93
5.4.2;5.2 High-Energy Lasers;95
5.4.2.1;References;102
5.5;6 Excimer Lasers for Microlithography;103
5.5.1;6.1 Motivation;103
5.5.2;6.2 Wavelengths;106
5.5.3;6.3 Spectral Output;108
5.5.4;6.4 Line Narrowing;108
5.5.5;6.5 Wavelength Control;109
5.5.6;6.6 Laser Power and Energy;112
5.5.7;6.7 Energy Dose Control;112
5.5.8;6.8 Dual-Chamber Lasers;113
5.5.9;6.9 Pulse Length;115
5.5.10;6.10 Outlook;116
5.5.11;References;117
5.6;7 Laser Beam Characterization;118
5.6.1;7.1 Introduction;118
5.6.2;7.2 Recording of Spatial Beam Profiles;118
5.6.3;7.3 Evaluation of Beam Parameters;120
5.6.4;7.4 Wavefront Measurement;127
5.6.5;References;129
5.7;8 Optical Coatings for Excimer Laser Applications;131
5.7.1;8.1 Introduction;131
5.7.2;8.2 Basics;131
5.7.3;8.3 Interaction Mechanisms of UV Photons with Coated Optical Elements;132
5.7.4;8.4 Absorption;133
5.7.5;8.5 Coatings;134
5.7.6;8.6 XUV Coatings;136
5.7.7;8.7 Summary;138
5.7.8;References;138
5.8;9 Small Structures with Large Excimer Lasers;139
5.8.1;9.1 Introduction;139
5.8.2;9.2 Nozzle Plates for Ink Jet Printers;139
5.8.3;9.3 Attenuators;140
5.8.4;9.4 Homogenizers;142
5.8.5;9.5 Projection Lenses;144
5.8.6;9.6 Mechanically and Thermally Stable Support System;145
5.8.7;9.7 Beam Diagnostics;145
5.8.8;9.8 Summary and Outlook;147
5.8.9;References;147
6;Applications;149
6.1;10 Overview;150
6.1.1;References;156
6.2;11 Ablative Micro-Fabrication;159
6.2.1;11.1 Ablation;159
6.2.1.1;References;163
6.2.2;11.2 Micro-Machining;165
6.2.2.1;References;194
6.2.3;11.3 Via Drilling;197
6.2.3.1;References;209
6.3;12 Micro-Processing of Borosilicate Glass and Polymers;211
6.3.1;12.1 Borosilicate Glass;211
6.3.2;12.2 Polymers;222
6.3.3;References;229
6.4;13 F2- Laser Microfabrication for Photonics and Biophotonics;230
6.4.1;13.1 Introduction;230
6.4.2;13.2 Vacuum-Ultraviolet Optical Tools;231
6.4.3;13.3 Micromachining of Silica Glasses;237
6.4.4;13.4 Micro-Optics Fabrication;243
6.4.5;13.5 Controlling Refractive Index;262
6.4.6;13.6 Biophotonics on a Chip;277
6.4.7;References;281
6.5;14 Nano-Structuring with Femtosecond Excimer Laser Pulses;287
6.5.1;14.1 Introduction;287
6.5.2;14.2 The Laser System;288
6.5.3;14.3 Mask Projection;289
6.5.4;14.4 Interference Techniques;289
6.5.5;References;291
6.6;15 Physical Aspects of Ultra- Fast UV Laser Transfer;292
6.6.1;15.1 Introduction to the Laser Transfer Process;292
6.6.2;15.2 Visualization of the Laser Materials Transfer;294
6.6.3;References;301
6.7;16 Material Modification;302
6.7.1;16.1 Microlithography;302
6.7.2;16.2 TFT Annealing;313
6.7.3;16.3 Fiber Bragg Gratings;320
6.7.4;16.4 Marking;328
6.7.5;16.5 Activation and Metallization of Dielectrics;338
6.7.6;References;340
6.8;17 Excimer-Laser Assisted Deposition of Carbon and Boron Nitride- Based High- Temperature Superconducting Films;341
6.8.1;17.1 Introduction;341
6.8.2;17.2 Characteristics of Excimer Laser Ablation;342
6.8.3;17.3 Deposition Techniques;346
6.8.4;17.4 Deposition and Properties of Tetrahedral Amorphous Carbon (ta-C) Films;347
6.8.5;17.5 Deposition and Properties of Cubic Boron Nitride ( c-BN) Films;352
6.8.6;17.6 Summary and Outlook;355
6.8.7;References;356
6.9;18 Combustion Analysis;357
6.9.1;18.1 Scattering Methods;358
6.9.2;18.2 Fluorescence Methods;362
6.9.3;References;366
6.10;19 Medical Applications of Excimer Lasers;367
6.10.1;19.1 Refractive Laser Surgery;367
6.10.2;19.2 Glaucoma Surgery;373
6.10.3;19.3 Laser Angioplasty;375
6.10.4;19.4 XeCl Excimer Laser Treatment of Psoriasis;376
6.10.5;References;376
6.11;20 High-Intensity Applications of Excimer Lasers;378
6.11.1;20.1 Introduction;378
6.11.2;20.2 Precis of Experimental Findings;378
6.11.3;20.3 Conclusions;386
6.11.4;References;387
6.12;21 High-Repetition-Rate Applications of Excimer Lasers;389
6.12.1;21.1 Introduction;389
6.12.2;21.2 Technological Advances;390
6.12.3;21.3 High-Repetition-Rate Applications;394
6.12.4;References;401
6.13;22 New Frontiers: Extreme-Ultraviolet (EUV) Technology at 13.5nm;402
6.13.1;22.1 Prospects of EUV Lithography Drive the Development of High- Power EUV Sources;402
6.13.2;22.2 Challenges of EUV Lithography;404
6.13.3;22.3 Basic Technology and Requirements for EUV Sources;407
6.13.4;22.4 Gas-Discharge-Produced and Laser- Produced Plasma EUV Sources;409
6.13.5;22.5 GDPP and LPP EUV Sources – State of the Art;415
6.13.6;22.6 Outlook;422
6.13.7;References;424
7;List of Abbreviations;426
8;Index;430