Buch, Englisch, 367 Seiten, Format (B × H): 178 mm x 254 mm, Gewicht: 713 g
Buch, Englisch, 367 Seiten, Format (B × H): 178 mm x 254 mm, Gewicht: 713 g
Reihe: The IBM Research Symposia Series
ISBN: 978-1-4684-4849-8
Verlag: Springer US
The papers collected in this volume were presented at the International Symposium on Methods and Materials in Microelectronic Technology. This symposium was sponsored by IBM Germany, and it was held September 29 - October 1, 1982, in Bad Neuenahr, West Germany. The progress of semiconductor and microelectronic technology has become so rapid and the field so sophisticated that it is imperative to exchange the latest insight gained as frequently as it can be accomplished. In addition, it is peculiar for this field that the bulk of the investigations are carried out at industrial research and development laboratories, which makes some of the results less readily accessible. Because of these circumstances, the academic community, which among other things, is supposed to communicate the prog ress in this field to students of different disciplines, finds it rather difficult to stay properly informed. It was the intent of this IBM sponsored symposium to bring together key scientists from academic institutions, primarily from Europe, with principal investigators of the industrial scene. Accordingly, this symposium exposed technologists to scientists and vice versa. Scientific advances often lead directly to technological innovations. In turn, new technologies are often arrived at empirically and, because of that, are initially poorly understood. Scientific inquiry then attempts to probe these processes and phenomena in order to achieve a better understanding. Thus science and technology are intricately interconnected, and it is important that technical exchange between technolo gists and scientists is facilitated, since the problems are typically interdiscipli nary in nature.
Zielgruppe
Research
Autoren/Hrsg.
Weitere Infos & Material
Impact of Microelectronics- Technical, Economical and Social Aspects.- Milestones in Silicon Semiconductor Technology.- Electronic Transport in Semiconductor Materials.- Recent Advances in the Theory of Impurities and Defects in Semiconductors.- Silicide Contact and Gate in Microelectronic Devices.- Photolithography and X-Ray Lithography.- Electron Beam Lithography.- Microlithography for VLSI and Beyond.- Lithographic Materials.- Reactive Ion Etching and Related Polymerization Processes.- Organic Insulators.- Multilayer Ceramics.- High Performance Cooling and Large Scale Integration.- Limitation of Digital Electronics.- Electron Beam Microcircuit Inspection Technique.
