E-Book, Englisch, 264 Seiten
Rahman Vistas in Nanofabrication
Erscheinungsjahr 2012
ISBN: 978-981-4364-57-7
Verlag: Pan Stanford Publishing
Format: PDF
Kopierschutz: Adobe DRM (»Systemvoraussetzungen)
E-Book, Englisch, 264 Seiten
ISBN: 978-981-4364-57-7
Verlag: Pan Stanford Publishing
Format: PDF
Kopierschutz: Adobe DRM (»Systemvoraussetzungen)
This book provides several examples of how diverse nanofabrication techniques are being used by researchers across the world to fabricate useful materials and devices. A number of research groups present their cutting-edge work on fabricating a variety of nanoscale structures such as split rings, wires, gaps, trenches, and holes. The innovative techniques described in this book will be of interest to all who are engaged in research and development of nanofabrication technologies. The book mainly covers application areas in electronics and photonics but the techniques are general enough to be applied to other areas.
Autoren/Hrsg.
Fachgebiete
- Technische Wissenschaften Maschinenbau | Werkstoffkunde Produktionstechnik Fertigungstechnik
- Technische Wissenschaften Technik Allgemein Nanotechnologie
- Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Materialwissenschaft: Biomaterialien, Nanomaterialien, Kohlenstoff
- Technische Wissenschaften Elektronik | Nachrichtentechnik Elektronik Elektronische Baugruppen, Elektronische Materialien
Weitere Infos & Material
Preface
Nanosphere lithography for high-density nanopatterning
Hirotaka Oshima, Fujitsu Laboratories, Japan
Dry etching of semiconductors at the nano and micro scale
S. J. Pearton, University of Florida, USA
Nanoscale split ring resonator-based metamaterials
Basudev Lahiri, Max Planck Institute for the Science of Light, Germany
Nanofabrication of high-performance light-emitting diodes
Faiz Rahman, University of Glasgow, UK
On-film formation of nanowires: A route to defect-free nanowire growth and device fabrication
Jin-Seo Noh, Yonsei University, Korea
Nanotrenches: an optical lithography process for high aspect ratio sub-100 nm gaps
Jean-Francois Dayen, University of Strasbourg, France
High aspect ratio metallic nanostructures for transparent electrodes
Joong-Mok Park, Ames Laboratory, USA
Fabrication of nanogap electrodes by electroless- and electro-deposition
Luis De Los Santos Valladares, University of Cambridge, UK
Nanometer-scale processing by tribological action and its potential applications
Shojiro Miyake, Nippon Institute of Technology, Japan
Nano-materials integration on CMOS platforms
Sumita Santra, University of Cambridge, UK
Focused ion beam fabrication of metallic nanostructures
Michal Urbanek, Brno University of Technology, Czech Republic
Naotechnology showcase
Xianzhong Chen, Li Zhang, Jingbiao Cui, Yu Ying, Bjornholm, Yuri Gogotsi, Gary Zabow, Xinping Zhang, Lepsa and Faiz Rahman