Marr Handbook on Synchrotron Radiation

Vacuum Ultraviolet and Soft X-ray Processes
1. Auflage 2013
ISBN: 978-1-4832-9063-8
Verlag: Elsevier Science & Techn.
Format: PDF
Kopierschutz: 1 - PDF Watermark

E-Book, Englisch, Band Volume 2, 859 Seiten, Web PDF

Reihe: Handbook on Synchrotron Radiation

Volume 2 of this series concentrates on the use of synchrotron radiation which covers that region of the electromagnetic spectrum which extends from about 10eV to 3keV in photon energy and is essentially the region where the radiation is strongly absorbed by atmospheric gases. It therefore has to make extensive use of a high vacuum to transport the radiation to the workstation where the presence of hard X-rays can cause extensive damage to both the optics and the targets used in the experimental rigs. The topics chosen for this volume have been limited to the disciplines of physics and chemistry.

Autoren/Hrsg.

Marr, G. V.

Inhaltsverzeichnis

1;Front Cover;1
2;Handbook on Synchrotron Radiation;4
3;Copyright Page;5
4;Table of Contents;8
5;Preface;6
6;Contributors to Volume 2;12
7;Chapter 1. Synchrotron radiation sources;14
7.1;1. Introduction;16
7.2;2. Synchrotron radiation sources in the soft X-ray (SXR) and vacuum ultraviolet (VUV) regions;19
7.3;3. The prospects for increasing the brilliance of SR sources in the soft X-ray region;27
7.4;4. Synchrotron radiation source installations;32
7.5;References;33
8;Chapter 2. Optical engineering;34
8.1;1. Introduction;36
8.2;2. The synchrotron radiation source;37
8.3;3. Mirrors;48
8.4;4. Diffraction grating optics;69
8.5;5. Beam line layout;97
8.6;6. Optical components;112
8.7;7. Beam line auxiliary equipment;122
8.8;8. Conclusion;129
8.9;References;130
9;Chapter 3. Data aquisition and analysis systems;134
9.1;1. Introduction;136
9.2;2. Data aquisition electronics;137
9.3;3. Local computer systems;161
9.4;4. Data processing facilities;170
9.5;Acknowledgements;182
9.6;References;183
10;Chapter 4. High resolution spectroscopy of atoms and molecules including Faraday rotation effects;188
10.1;1. Introduction;190
10.2;2. High resolution spectra of atoms;190
10.3;3. High resolution spectra of molecules;225
10.4;4. SR experiments with polarised radiation;243
10.5;5. Conclusion;249
10.6;Acknowledgements;250
10.7;References;250
11;Chapter 5. Resonances in molecular photoionization;254
11.1;1. Introduction;256
11.2;2. Shape resonances;258
11.3;3. Autoionization;276
11.4;4. Triply differential photoelectron measurements - experimental aspects;288
11.5;5. Case studies;293
11.6;6. Survey of related work;343
11.7;7. Prospects for future progress;347
11.8;Appendix. A bibliography on shape resonances in molecular photoionization through early 1985;349
11.9;References;355
12;Chapter 6. Molecular photodissociation and photoionization;368
12.1;1. General introduction;370
12.2;2. Experimental methods;374
12.3;3. Selected examples;395
12.4;4. Miscellaneous and future trends;468
12.5;Acknowledgments;471
12.6;References;471
13;Chapter 7. Surface science with synchrotron radiation;480
13.1;1. Introduction;482
13.2;2. Techniques;482
13.3;3. Clean surfaces;489
13.4;4. Surfaces with adsorbates;513
13.5;5. Interfaces;534
13.6;6. Conclusions;546
13.7;References;546
14;Chapter 8. Metal–semiconductor interface studies by synchrotron radiation techniques;554
14.1;1. Introduction;556
14.2;2. Metal–semiconductor interactions and electronic properties;557
14.3;3. Soft X-ray photoemission spectroscopy for microscopic interface characterization;560
14.4;4. Chemical bonding at metal-semiconductor interfaces;562
14.5;5. Metal–semiconductor interdiffusion;589
14.6;6. Fermi level pinning and semiconductor band bending;595
14.7;7. Other synchrotron radiation techniques for interface analysis;607
14.8;8. Conclusions and future directions;613
14.9;Acknowledgement;616
14.10;References;616
15;Chapter 9. Inner shell photoelectron process in solids;624
15.1;1. Introduction;626
15.2;2. Fundamental theory of many-body effects in inner shell photoelectron process;627
15.3;3. Simple metals;636
15.4;4. Rare earth metals and compounds;640
15.5;5. Transition metals and compounds;652
15.6;6. Related topics;663
15.7;7. Concluding remarks;669
15.8;Acknowledgements;670
15.9;Appendix. Derivation of basic photoemission formulae;670
15.10;References;673
16;Chapter 10. Surface core level shift;676
16.1;1. Introduction;678
16.2;2. Surface–bulk core level shift for clean surfaces;679
16.3;3. Applications;706
16.4;4. Conclusion;731
16.5;Acknowledgements;732
16.6;References;732
17;Chapter 11. Optical constants;736
17.1;1. Introduction;738
17.2;2. Definitions;739
17.3;3. Sample characteristics;751
17.4;4. Measurement methods;755
17.5;5. Summary;775
17.6;6. Some examples;777
17.7;7. Comments on data collections and recent literature;783
17.8;Appendix: Recent literature reference to optical data for E = 6eV;785
17.9;References;788
18;Author index;798
19;Subject index;842