Theory and Application of Laser Chemical Vapor Deposition

Softcover Nachdruck of the original 1. Auflage 1995
ISBN: 978-1-4899-1432-3
Verlag: Springer US

Buch, Englisch, 396 Seiten, Paperback, Format (B × H): 152 mm x 229 mm, Gewicht: 589 g

Reihe: Lasers, Photonics, and Electro-Optics

In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to apply these principles to developing theories about various types of LCVD processes; gain greater insight into the basic mechanisms of LCVD; and obtain the ability to design and control an LCVD system.

Zielgruppe

Research

Autoren/Hrsg.

Kar, Aravinda

Mazumder, J.

Fachgebiete

• Technische Wissenschaften Energietechnik | Elektrotechnik Elektrotechnik
• Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Materialwissenschaft: Elektronik, Optik

Inhaltsverzeichnis

1. Introduction.- 2. Pyrolytic LCVD.- 3. Photolytic LCVD.- 4. Pyrolytic LCVD Modeling.- 5. Photolytic LCVD Modeling.- A.1. Definitions of Energy Density, Irradiance, and Intensity.- A.2. Thermal Stress Analysis.- A.3. Volumetric Absorption Rate.- Nomenclature.- References.